METHOD FOR MODIFYING DEFECTIVE PART OF PHOTOMASK

摘要

PURPOSE:To solve the problem of exfoliation of a formed modifying film by washing as well as to shorten the time required to modify the defective part of the pattern layer of a photomask. CONSTITUTION:When the defective part 5 of the pattern layer of a photomask is modified, a thin carbon film 1 with gas is first formed in the chipped part 5 by a convergent ion beam method and then the gaps are filled with a thin Cr film 2 by a laser irradiation method.