| 摘要 |
PURPOSE:To accurately and rapidly draw a pattern even for an LSI having a large number of patterns, by dynamically changing electron beam irradiation time and controlling the quantity of irradiated electrical current. CONSTITUTION:An electron beam pattern drawing device is provided with a beam current controller 9 for regulating the grid voltage of an electron gun 1, a beam deflection circuit 5 for controlling irradiation time and an electron beam intermission circuit 8. The controller 9 and the circuits 5, 8 are collectively regulated by a control circuit 10. Control signals are supplied from the circuits 8, 5 into a cylinder 2 containing the electron gun 1 and a workpiece 3 set on a workpiece carriage 4. A D/A conversion circuit 11, which is controlled by an elecrtonic computer 13, is connected to the circuit 10. Pattern drawing information is supplied to the computer 13 from a detection signal amplifier 6, a carriage control circut 7 and an interface 12. A pattern is thus drawn at high integration, accuracy and velocity. |
