| 摘要 |
PURPOSE:To avoid the abnormality of the pattern dimensions of a dyeing base layer, avoid the shading of a pattern edge and improve the accuracy of a mosaic pattern. CONSTITUTION:Solid state image pickup elements are formed on a substrate 1. Transparent polymer resin is applied to the surface of the substrate 1 to form an acrylic flattening layer 4. Then high resolution positive resists 5 is applied to the surface by spin-coating and exposed to a light such as g-ray, h-ray, i-ray, etc., with a photomask 6 to form resist patterns 5a so as to cover the upper part of a light receiving part 2. then negative resist 7 such as gelatin, casein, PVA, etc., is applied to the surface by spin-coating and exposed with a photomask 8 having a pattern with which the negative resist 7 is left between the resist pattern 5a and developed. With this constitution, the negative resist layers (dyeing base layers) are buried between the resist patterns 5a. |
