| 摘要 |
PURPOSE:To restrain the temperature change of a fluid to be transported so as to enable accurate processing during the manufacturing process of semiconductor devices by measuring the temperature of the fluid to be transported at the outlet of a pump, and feedbacking the measurement to a high-pressure air overheating device. CONSTITUTION:A wafer 13 is immersed in sulfuric acid retained in a processing tank 11 and is processed. The sulfuric acid is heated by a heater 14 and circulated through a filter 15 by a pump 16. The temperature of the sulfuric acid, a fluid to be transported, is measured at the outlet of the pump 16 using a temperature sensor 17 and the output of a heater 19 located at the inlet of the displacement pump 16 driven by a high-pressure gas is controlled by a controller 18 so that the temperature of the sulfuric acid is held almost constant throughout a circulating system. Therefore, the temperature drop of the sulfuric acid that could be caused by the adiabatic expansion of high-pressure air inside the pump is prevented by heating of the high-pressure air, so that the possibility of the temperature of the processing liquid in the processing tank 11 becoming uneven can be eliminated. |
