| 摘要 |
PURPOSE:To treat a CVD exhaust gas and a cleaning exhaust gas of the CVD device to remove their harmful components at the time of using an organic compound as a raw material of the CVD. CONSTITUTION:An adsorption vessel having a size of 350mm diameter and 5000mm height is packed with 50 liters of molecular sieve having a particle size of 2.36 to 4.75mm diameter and 9Angstrom average pore diameter. Also, a catalyst vessel having a size of 200mm diameter and 80mm height is packed with 2.5 liters of a manganese oxides based catalyst. The adsorption vessel and the catalyst vessel are disposed in series. The CVD exhaust gas contains 100ppm TEOS, 200ppm CH3CHO, 2000ppm C2H5OH, 3000ppm CO and 1000ppm H2, and the cleaning exhaust gas contains 400ppm SiF4 and 100ppm F2, to which 2% oxygen is added. Each of the CVD exhaust gas and the cleaning exhaust gas is alternately supplied through the above vessels for 3min/run and 2min/run, respectively, keeping the temperature in the center of the catalyst vessel at 150 deg.C. Runs up to 6910 of this treatment can be performed until the CO content of any one of the treated exhaust gases exceeds the allowable concentration. |
