Substrate deposition chamber - contains a gas at an adjusted partial pressure to apply thin coating of HT superconductive material through a particle stream

摘要

The appts. to coat a substrate surface through a stream of particles detached from a material, has a coating chamber (4) containing a gas set to a partial pressure (p) between 10-3 mbar and 10 mbar and a laser ablation appts. The substrate body (3) to be coated is aligned so that the levels of the surfaces (3a) to be coated are generally at right angles to the line of the spread particle stream (5) of coating material. USE/ADVANTAGE - The assembly is for the development of a coating of a metal oxide HT superconductive material in a thin layer. The appts. gives a thin coating deposit over large surfaces, irrespective of the coating material, with smooth surfaces and good homogeneity.