发明名称 |
Pellicle for photolithographic mask |
摘要 |
A pellicle for dust-proofing of a photolithographic mask used for patterning in the manufacturing process of semiconductor devices. The drawback due to dust deposition can be greatly decreased in the use of a pellicle made from a fluorocarbon resin which is a copolymer of tetrafluoroethylene and another fluorocarbon monomer capable of introducing a cyclic perfluoroether group into the molecule when the pellicle film is rendered antistatically hydrophilic, for example, by a plasma treatment. |
申请公布号 |
US5286567(A) |
申请公布日期 |
1994.02.15 |
申请号 |
US19920912792 |
申请日期 |
1992.07.13 |
申请人 |
SHIN-ETSU CHEMICAL CO., LTD. |
发明人 |
KUBOTA, YOSHIHIRO;KASHIDA, MEGURU;NAGATA, YOSHIHIKO;NOGUCHI, HITOSHI |
分类号 |
C08F214/06;B29C35/08;B29C59/16;C08F34/00;C08F214/26;C08F234/02;G03F1/14;G03F1/40;G03F1/62;H01L21/027;(IPC1-7):B32B27/00 |
主分类号 |
C08F214/06 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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