发明名称 |
Method of patterning organic macromolecular film |
摘要 |
A CEL material (11) is formed such that a first region (11a) thereof which is formed on a concave portion of a semiconductor substrate (1) is sufficiently thicker than a second region (11b) thereof which is formed on the other region. Light (4) is directed from above to the CEL material (11) for a predetermined period of time to render only the thin second region pervious to light to thereby expose part of a photoresist (2) which is under the second region (11b) by the illumination. Subsequently, the semiconductor substrate (1) is immersed in an appropriate solvent to remove only part of the photoresist (2) which is under the first region (11a). The part of the photoresist (2) which is under the second region 11b remains unremoved. The photoresist (2) can be patterned with the shape of the concave portion of the semiconductor substrate (1) accurately reflected therein.
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申请公布号 |
US5286610(A) |
申请公布日期 |
1994.02.15 |
申请号 |
US19920863732 |
申请日期 |
1992.04.06 |
申请人 |
MITSUBISHI DENKI KABUSHIKI KAISHA |
发明人 |
HISA, YOSHIHIRO |
分类号 |
G03F7/26;G03F7/09;G03F7/095;H01L21/027;H01L21/30;(IPC1-7):G03C5/00 |
主分类号 |
G03F7/26 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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