发明名称 EXPOSING METHOD AND ACTINOMETER
摘要 PURPOSE:To provide the exposing method which can easily execute a development operation by inducing an adequate photochemical reaction in a photoresist on the surface of a substrate and in through-holes. CONSTITUTION:A light receiving part 23 having recessed parts of the diameter nearly equal to the through-holes is arranged near the substrate 1. The light quantity of UV rays 26 made incident on the photoresist within the through-holes or on the surface of the substrate is determined by measuring the light quantity of the incident UV rays 26 on the light receiving part 23 at each time of irradiating the substrate 1 with the UV rays once or plural times. The quantity of the working light received by the actinometer is so set that the determined light quantity nearly equalizes to the value obtd. by dividing the standard exposure or the permissible max. exposure of the photoresist by the number of irradiation times.
申请公布号 JPH0627675(A) 申请公布日期 1994.02.04
申请号 JP19920185052 申请日期 1992.07.13
申请人 ORC MFG CO LTD 发明人 KENMOCHI HARUYASU;WATANUKI MINORU
分类号 G01J1/02;G03F7/20;H01L21/027;(IPC1-7):G03F7/20 主分类号 G01J1/02
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