PHASE SHIFT PHOTO MASK

摘要

A chroma layer (12) on a mask layer (11) is etched with the help of a photo resisting layer (13). A first phase shifting layer (14) is fabricated on the patterned chrome layer (12), a second phase shifting layer (15) on the first phase shifting layer. A second photo resist mask (15a) is built on the second phase shifting layer (15). The first phase shifting layer (14) is etched to form a first phase-shift mask (14a) and a second phase-shift mask (15a).