| 摘要 |
PURPOSE:To shorten the time for production by patterning a resist for patterning a shifter to a shape which itself is usable as the shifter, then making inspection. CONSTITUTION:A light shielding film 2 is formed on a glass substrate 3 and is patterned. A shifter material 1 is then formed thereon and a resist 4 is applied thereon. The resist is exposed and developed (so-called patterning) to form the resist 4 to the shape which is usable as the shifter. The inspection is made in the state of having such structure. Then, the removal of the resist 4 and the reapplication thereof are merely necessitated and there is no need for forming the shifter from the shifter material 1 if a defect is discovered at this time. The shorter production process is, therefore, necessitated. This resist is usable as a phase shift mask in the state of the as-inspected structure and, therefore, the use of the resist once in this state in case of a short delivery time or the like and the patterning of the shifter material 1 to the final structure after a time allowance is obtd. are feasible as well. |
