| 摘要 |
PURPOSE:To eliminate the influence of particles at the time of exposing, etc., even if the particles stick to the surface of the blanks at the time of storage, etc., of the structure of the blanks for production of a photomask to be utilized for production of a semiconductor device, etc. CONSTITUTION:A film 4 is stuck to the surface of the blanks after the application of a resist 3 on the blanks, this film 4 is peeled before exposing, etc., by which the particles adhered onto the blanks till then are removed. Exposing of the film in the state of holding the film 4 stuck at the time of the exposing is possible in the case of the film 4 transmitting the exposing light. The use of only the film 4 which does not allow the transmission of the exposing light and the use of the film which does not allow the transmission of the exposing light and the film which allows the transmission of the exposing light by superposing two sheets of these films are possible as well. The exposing of the resist 3 is prevented since the blanks are produced before the blanks are used in the case of the film which does not allow the transmission of the exposing light. |
