发明名称 |
FORMING METHOD FOR QUANTUM FINE LINE ON BASE |
摘要 |
PURPOSE:To provide a method for forming a quantum fine line in which diameters, lengths and directions of fine lines are substantially uniform among the lines and a desired quantum effect can be expected by making the diameters of the lines even in a longitudinal direction of the lines substantially uniform. CONSTITUTION:A method for forming quantum fine lines 7 on a base 1 comprises the steps of ion implanting the base 1 to be formed with the fine lines, and anodizing the base 1 in hydrofluoric acid or plasma P. |
申请公布号 |
JPH0620946(A) |
申请公布日期 |
1994.01.28 |
申请号 |
JP19920175849 |
申请日期 |
1992.07.03 |
申请人 |
NISSIN ELECTRIC CO LTD |
发明人 |
HAYASHI TSUKASA;TAKEUCHI MAKOTO |
分类号 |
H01L21/20;H01L21/265;H01L21/316;H01L29/06;H01L33/34 |
主分类号 |
H01L21/20 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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