发明名称 FORMING METHOD FOR QUANTUM FINE LINE ON BASE
摘要 PURPOSE:To provide a method for forming a quantum fine line in which diameters, lengths and directions of fine lines are substantially uniform among the lines and a desired quantum effect can be expected by making the diameters of the lines even in a longitudinal direction of the lines substantially uniform. CONSTITUTION:A method for forming quantum fine lines 7 on a base 1 comprises the steps of ion implanting the base 1 to be formed with the fine lines, and anodizing the base 1 in hydrofluoric acid or plasma P.
申请公布号 JPH0620946(A) 申请公布日期 1994.01.28
申请号 JP19920175849 申请日期 1992.07.03
申请人 NISSIN ELECTRIC CO LTD 发明人 HAYASHI TSUKASA;TAKEUCHI MAKOTO
分类号 H01L21/20;H01L21/265;H01L21/316;H01L29/06;H01L33/34 主分类号 H01L21/20
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