发明名称 Photosensitive compositions and lithographic printing plates with reduced propensity to blinding.
摘要 <p>Photosensitive compositions, useful in lithographic printing plates which can be developed with aqueous developing solutions, comprise a diazo resin, an acid-substituted ternary acetal polymer, and a copolyester of an unsaturated dicarboxylic acid and an oxyalkylene ether of an alkylidene diphenol. The acid-substituted ternary acetal polymers are comprised of recurring units which include three six-membered cyclic acetal groups, one of which is unsubstituted or substituted with an alkyl or hydroxyalkyl group, another of which is substituted with an aromatic or heterocyclic moiety, and a third of which is substituted with an acid group, an acid-substituted alkyl group or an acid-substituted aryl group.</p>
申请公布号 EP0580530(A2) 申请公布日期 1994.01.26
申请号 EP19930420303 申请日期 1993.07.16
申请人 EASTMAN KODAK COMPANY 发明人 WALLS, JOHN E.
分类号 G03F7/00;G03F7/021;G03F7/027;G03F7/033;(IPC1-7):G03F7/021 主分类号 G03F7/00
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