RADIATION SENSITIVE RESIN COMPOSITION FOR DRY DEVELOPMENT

摘要

PURPOSE:To obtain a radiation-sensitive resin compsn. for dry development having high sensitivity and high resolution which can be used for various radia tion including far UV rays such as KrF excimer laser beam. CONSTITUTION:This compsn. contains (1) phenol-type hydroxyl group-contg. resin and 1,2-naphthoquinone diazide-4-sulfonate compd., and/or (2) phenol-type hydroxyl group-contg. resin in which the phenol-type hydroxyl group is partly esterified to 1,2-naphthoquinone diazide-4-sulfonate.