CONDUCTIVE COMPOSITION FOR FORMATION OF PATTERN AND PATTERN FORMING METHOD USING THAT COMPOSITION

摘要

PURPOSE:To prevent displacement or dimensional error due to charging up in the patterning process. CONSTITUTION:This compsn. contains (a) 0.1-20 pts.wt. of sulfonated polyanilne having 20-80% sulfone group to aromatic rings, (b) 100 pts.wt. of solvent, and (c) 0.01-30 pts.wt. of amine and/or quaternary ammonium salt. Further if desired, 0-200 pts.wt. of (A) polymer compd. soluble with the solvent (b) and/or (B) surfactant may be added as the component (d).