| 摘要 |
PURPOSE:To enhance sensitivity, developability, pattern form, resolution, heat resistance, and film endurance by incorporating an alkali-soluble resin, a compound to be allowed to generate an acid by irradiation with radiation, and a specified compound. CONSTITUTION:This composition is composed of the alkali-soluble resin, the compound to be allowed to generate an acid by irradiation with radiation, and the compound having in the molecule at least 2 alkoxyalkyl or silyloxyalkyl groups directly combined with an aromatic ring, 1-8 aromatic rings, and a substituent represented by formula I in which each of R<1> and R<2> H or 1-3C alkyl; R<3> is 1-4C alkyl, a 5- or 6-membered alicyclic or heterocyclic group, or trialkylsilyl group; R<4> is H, halogen, 1-4C alkyl or alkenyl; and each of (l) and (m) is an integer between 1 and 5 and 0 and 4, respectively. |
