摘要 |
PURPOSE:To prevent electrostatic fault such as deposition of dust after development and to obtain good slidability by forming a specified antistatic lubricating layer on the opposite side of a film to a photosensitive layer. CONSTITUTION:A layer having antistatic property and lubricating property is formed on the opposite side of a film to a photosensitive layer. This layer contains 0.1-20wt.% structural unit comprising polysiloxane groups expressed by formula, 10-35wt.% ionic monomer unit, and 55-89.9wt.% hydrophobic monomer unit. This layer also contains copolymers obtd. by coupling the structural unit comprising polysiloxane groups and polymer segments comprising the ionic monomer unit and the hydrophobic monomer unit with sulfide bonds. In formula, R<1> is an alkylene group of 1-10 carbon number, R<2> is an alkyl or phenyl group of 1-10 carbon number, and n is >=5 in average. |