发明名称 |
Method for controlling evaporation for vapor deposition |
摘要 |
The invention relates to a method and an apparatus by means of which a material is vaporized in a treatment chamber by means of an electron beam. Due to controlling the inhomogenity of power distribution over the working area of the beam it becomes possible to prevent local overheating of the target material and thus of a deformation of the target surface. This is realized by oscillating the beam around its working point. The amplitude of the oscillation is, thereby, of almost a few beam diameters and this oscillation is superimposed on the momentarily working position of the beam on the target.
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申请公布号 |
US5277938(A) |
申请公布日期 |
1994.01.11 |
申请号 |
US19910753745 |
申请日期 |
1991.09.03 |
申请人 |
BALZERS AKTIENGESELLSCHAFT |
发明人 |
WEGMANN, URS;KOLLER, ALBERT;VOGT, JOSEF |
分类号 |
H01J37/30;C23C14/30;H05B7/00;(IPC1-7):B05D3/06;B23K15/00;C23C16/00 |
主分类号 |
H01J37/30 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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