METHOD FOR MEASURING THICKNESS OF OXIDE FILM ON REAR SURFACE OF SEMICONDUCTOR WAFER,申请号JP19920159113-传众专利搜索

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发明名称	METHOD FOR MEASURING THICKNESS OF OXIDE FILM ON REAR SURFACE OF SEMICONDUCTOR WAFER
摘要
申请公布号	JPH063353(A)	申请公布日期	1994.01.11
申请号	JP19920159113	申请日期	1992.06.18
申请人	KAWASAKI STEEL CORP	发明人	YAMADA TOSHIO
分类号	G01B21/08;G01N31/12;(IPC1-7):G01N31/12	主分类号	G01B21/08
代理机构		代理人
主权项
地址

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