Semiconductor integrated circuit device for forming logic circuit including resistance element connected to bipolar transistor with smaller occupied area

摘要

Disclosed is an improved Bi-CMOS gate array for increasing integration density. The gate array includes a predetermined region for forming PMOS transistors, a predetermined region for forming bipolar transistors, a predetermined region for forming resistance elements, and a predetermined region for forming NMOS transistors. The resistance element region is formed adjacent to the bipolar transistor region, and, therefore, it is not necessary to provide any interconnection for forming a logic circuit including the resistance element connected to the bipolar transistor. An area occupied by interconnections on the semiconductor substrate is thus reduced, and, therefore the integration density is increased.