| 发明名称 |
Positive radiation-sensitive resist composition |
| 摘要 |
A positive radiation-sensitive resist composition comprising an alkali-soluble resin, a radiation-sensitive ingredient and a phenol compound represented by the general formula (I): (* CHEMICAL STRUCTURE *) (I) wherein R1, R2 and R3 independently of one another each represent a hydrogen atom, an alkyl group or an alkoxy group and n represents 1, 2 or 3.
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| 申请公布号 |
US5275910(A) |
申请公布日期 |
1994.01.04 |
| 申请号 |
US19920960695 |
申请日期 |
1992.10.14 |
| 申请人 |
SUMITOMO CHEMICAL COMPANY, LIMITED |
发明人 |
MORIUMA, HIROSHI;NAKANISHI, HIROTOSHI;UETANI, YASUNORI |
| 分类号 |
G03F7/004;G03F7/022;G03F7/039;H01L21/027;(IPC1-7):G03F7/022 |
主分类号 |
G03F7/004 |
| 代理机构 |
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