| 摘要 |
<p>PURPOSE:To produce a quartz glass material, e.g. a large-sized tool material for a semiconductor process in high purity for a short time. CONSTITUTION:Crystalline or amorphous silica having >=1 to <=500mum average grain diameter is mixed with 'a mixture composed of a silicic acid ester, water regulated to pH<=3 and a water-soluble organic solvent having >=120 deg.C boiling point' in 300-100 pts.wt. total amount thereof and the resultant mixture is gelatinized in a mold, released from the mold and then thermally sintered at 1400-1850 deg.C.</p> |
