| 摘要 |
PURPOSE:To obtain a positive type photoresist compsn. excellent in resolving power, sensitivity, developability and heat, resistance and suitable for use as a photoresist for fine processing. CONSTITUTION:This positive type photoresist compsn. contains an alkalisoluble resin and 1,2-naphthoquinonediazido-5-(and/or-4-) sulfonic ester of a polyhydroxy compd. represented by the formula, wherein R is a mono- or divalent org. group, each of R1-R4 is H, hydroxyl, halogen, alkyl or alkoxy and (n) is 1 or 2 as a number corresponding to the one or two bonding radicals of the org. group R. |
