| 摘要 |
PURPOSE:To obtain a positive type photoresist compsn. excellent in resolving power, sensitivity, developabililty and heat resistance and suitable for use as a photoresist for fine processing. CONSTITUTION:This positive type photoresist compsn. contains an alkalisoluble resin, a quinonediazido compd. and a compd. represented by the formula, wherein each of R1-R5 is H, hydroxyl, halogen, alkyl or alkoxy, at least one of R1-R5 is hydroxyl, X is a single bond or -(CH2)m-, Y is -COO-X- or -OCO-X-, Z is an n-valent org. group (n) is an integer of 3-6 and (m) is an integer of 1-4. |
