VACUUM EVAPORATION DEVICE FOR POLYGON MIRROR

摘要

PURPOSE:To suppress the variations in the reflectivity of the mirror finished surfaces of a polygon mirror by adjusting the spacing of the slit of a slit adjusting plate through which the material to be deposited by evaporation in the device passes and rotating a flat plate disposed between an electron gun. CONSTITUTION:The flat plate 11 provided below the slit adjusting plate 1 is rotated counterclockwise with the polygon mirror 8 around a revolving shaft 12 of the flat plate by the intermesh of the gear of the mirror 8 and the gear of the flat plate 11 according to the rotation of the mirror 8. The material v to be deposited by evaporation from the electron gun is radiated to the mirror finished surfaces 8a to 8f, respectively of the rotating mirror 8 through the spacing h of the adjusting plate 1 from the outer periphery of the rotating flat plate 11 and forms the vapor deposited films on the mirror finished surfaces of the mirror 8 when the mirror 8 moves the upper position of the electron gun. The amt. of the material v to be deposited by evaporation passing the spacing h of the adjusting plate 1 is regulated by adjusting the spacing, by which the distribution of the thicknesses of the vapor deposited films to be formed on the mirror finished surfaces 8a to 8f of the mirror 8 is controlled.