| 摘要 |
PURPOSE:To provide an energy beam setting resin composition capable of diluting with water, redissolving an unexposing part with water, obtaining a fine image with high sensitivity and a coating film having excellent water resistance, solvent resistance and plate wear. CONSTITUTION:The photosensitive resin composition is made by mixing a water soluble compound having one or two or more unsaturated double bond, a photopolymerization initiator and furthermore a photocrosslinking agent with a partially saponified vinyl acetate polymer solution. The photosensitive resin composition is excellent in stability and various performance and capable of obtaining the fine image with high sensitivity and the coating film having excellent water resistance, solvent resistance and plate wear. |
