发明名称 PRODUCTION OF METALLIC THIN FILM
摘要 <p>PURPOSE:To form a metallic thin film on a crystal face in uniform thickness by controlling the distance between a desired grown metallic thin film deposited on a cathode and an anode and continuously depositing the desired thin film. CONSTITUTION:Two liq. phases are formed in an electrolytic cell 12 by an electrolyte soln. 14 and a liq. org. nonelectrolyte 13 having a higher sp.gr. than the soln. A cathode 20 is set at the interface between the phases 14 and 13, and electrolysis is conducted. The distance between the desired metallic thin film deposited on the tip 21 of the cathode and an anode 30 is controlled, and the thin film is continuously deposited. Electrolysis is carried out while winding the thin film to keep the distance between the tip of the deposited thin film and the anode constant. Consequently, the thin film need not be stripped, and a cast thin film is extremely easily prodiced.</p>
申请公布号 JPH05339780(A) 申请公布日期 1993.12.21
申请号 JP19920170059 申请日期 1992.06.04
申请人 MITSUBISHI MATERIALS CORP;KANEKO HIROYUKI 发明人 KANEKO HIROYUKI
分类号 C25C1/00;C25C7/06;C25D1/04;(IPC1-7):C25D1/04 主分类号 C25C1/00
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