发明名称 |
CHEMICAL VAPOR DEPOSITION PROCESS TO REPLICATE THE FINISH AND FIGURE OF PRESHAPED STRUCTURES |
摘要 |
A process is disclosed by which the finish and/or figure of polished preshaped structures (such as mirrors) can be replicated directly by chemical vapor deposition, with only minor polishing of the replica being required to obtain a final product, and with the original substrate being reusable for further replication. Relevant conditions under which the process can be carried out are given. Featured in the process is a pretreatment step prior to the deposition of a layer of silicon carbide to form the replica, which pretreatment step involves the formation on the polished substrate of an oxide layer and a carbon layer of high finish and uniform thickness. The carbon layer allows easy separation of the substrate and replica which otherwise would be bound together. |
申请公布号 |
CA2027171(C) |
申请公布日期 |
1993.12.21 |
申请号 |
CA19902027171 |
申请日期 |
1990.10.09 |
申请人 |
CVD, INC., |
发明人 |
TAYLOR, RAYMOND L.;PICKERING, MICHAEL A.;KEELEY, JOSEPH T. |
分类号 |
C23C16/22;C23C16/01;C23C16/26;C23C16/32;C23C16/44 |
主分类号 |
C23C16/22 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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