| 摘要 |
PURPOSE:To enable a negative photosensitive resin to be exposed to light without forming the image of a foreign object with an unmodified conventional device by a method wherein a photomask pattern is formed based on the calculation of the size of a foreign object attached to the photomask. CONSTITUTION:A pattern 5, where a required figure is enlarged along a certain direction to be larger than the maximum length of the projection of a foreign object expected to be attached to a photomask 1, is provided. The pattern 5 is transferred onto a negative photosensitive resin 6 on a substrate 8, the photomask 1 and the substrate 8 are aligned with each other, and then the photosensitive resin 6 is exposed to light. Then, the photomask 1 is made to move in a certain direction by a distance longer than the maximum length of the projection of a foreign object attached to the photomask 1, and then the photosensitive resin 6 is exposed to light again. By this setup, a cleanable photomask can be designed without using a pellicle, an aligning operation can be carried out at once, a conventional device is not required to be modified, and the image of a foreign object on a photomask is not formed. |
