发明名称 SEMICONDUCTOR FIELD EFFECT DEVICE AND MANUFACTURE THEREOF
摘要 PURPOSE:To realize both n-type and p-type lateral FET structures on the same substrate and to provide a simple method for manufacturing the same. CONSTITUTION:The semiconductor field effect device comprises a channel 4 made of a slender n-type or p-type region formed on a semi-insulating semiconductor substrate 1, and gate regions 5, 6 made of n-type or p-type region formed at a suitable gap from the channel 4 on the substrate 1 at both sides of the channel 4.
申请公布号 JPH05326565(A) 申请公布日期 1993.12.10
申请号 JP19920126267 申请日期 1992.05.19
申请人 NIPPON TELEGR & TELEPH CORP <NTT> 发明人 HIRAYAMA YOSHIO
分类号 H01L29/06;H01L21/338;H01L29/778;H01L29/812;(IPC1-7):H01L21/338 主分类号 H01L29/06
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