发明名称 |
SEMICONDUCTOR FIELD EFFECT DEVICE AND MANUFACTURE THEREOF |
摘要 |
PURPOSE:To realize both n-type and p-type lateral FET structures on the same substrate and to provide a simple method for manufacturing the same. CONSTITUTION:The semiconductor field effect device comprises a channel 4 made of a slender n-type or p-type region formed on a semi-insulating semiconductor substrate 1, and gate regions 5, 6 made of n-type or p-type region formed at a suitable gap from the channel 4 on the substrate 1 at both sides of the channel 4. |
申请公布号 |
JPH05326565(A) |
申请公布日期 |
1993.12.10 |
申请号 |
JP19920126267 |
申请日期 |
1992.05.19 |
申请人 |
NIPPON TELEGR & TELEPH CORP <NTT> |
发明人 |
HIRAYAMA YOSHIO |
分类号 |
H01L29/06;H01L21/338;H01L29/778;H01L29/812;(IPC1-7):H01L21/338 |
主分类号 |
H01L29/06 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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