| 摘要 |
A non-contact method for measuring the material-dependent optical phase change on reflection that occurs using phase shifting interferometry. A phase shifting interference microscope utilizing an extended, quasi-monochromatic illumination source (12-18) is used to generate a two beam interference intensity pattern at a given field position on a detector array (30). A reference surface (24) of known surface characteristics and an unknown test surface (32) being profiled are axially translated relative to each other while the interference intensity pattern impinging on the detector array (30) is sampled, digitized, stored and then utilized to produce a digitized two-beam interference intensity pattern, the shape of which is characteristic of the particular interference configuration. |
