POSITIVE TYPE PHOTORESIST COMPOSITION AND RESIST PATTERN PRODUCING METHOD

摘要

PURPOSE:To obtain a positive type photoresist compsn. having high resolution, capable of giving a resist pattern fit for fine. processing and especially useful in the production of a semiconductor device. CONSTITUTION:A compsn. contg. an alkali-soluble resin and a 1,2-quinonediazido compd. is blended with a compd. represented by the formula [where (n) is an integer of 1-25] to obtain the objective positive type photoresist compsn. A resist pattern is produced with this photoresist compsn.