| 摘要 |
PURPOSE:To provide a method of manufacturing a mask with which a Cr film pattern having desired dimensions can be surely and easily obtained. CONSTITUTION:A method of manufacturing a mask comprises the steps of successively forming a shield film 2 and a photosensitive organic film 3 on a light transmittable substrate 1, exposing and developing the photosensitive organic film 3 so as to form a photosensitive organic film pattern 3a having a first opening 4, etching the light shield film 2 within the first opening 4 with the use of the photosensitive organic pattern 3a as a mask so as to form a light shield film pattern 2a having a second opening 5, measuring the dimensions of at last either one of the second opening 5 and the light shield film pattern 2a with the use of a measuring method using transmitting light, removing the photosensitive organic film pattern 3a if the measured dimensions are within an allowable range while again etching light shield film pattern 2a, if the measured dimensions are shifted out of the allowable range, in accordance with a degree of the shift value, and thereafter, removing the photosensitive organic pattern 3a. |
