| 摘要 |
<p>PURPOSE:To provide an X-ray mask wherein the film thickness of an antireflection film can be controlled easily when the film is formed by a method wherein the visible-ray transmission factor of a membrane is increased, the accuracy of an alignment operation is enhanced and the antireflection characteristic of a wide band is obtained. CONSTITUTION:An SiC film 2 is used as an X-ray transmitting substrate; an antireflection film 52 which is composed of a TiO2 film or of a mixed film of SiO2 and TiO2 and whose refractive index is within a range of 1.5 to 1.8 is provided at least on one face of the SiC film.</p> |
