| 摘要 |
PURPOSE:To decrease residual films of a non-image part after developing to prevent staining by printing and to improve a plate inspection property by processing a base surface with a specific aq. soln. and aq. silicate soln. and providing a photosensitive layer contg. a diazo resin. CONSTITUTION:The surface of the pretreated base is processed with the aq. soln. contg. the compds. expressed by formulas I to III and is then processed with the aq. silicate soln.; thereafter, the negative type photosensitive layer contg. the diazo resin is provided on the base. After this base is processed with the aq. silicate soln., the base may be further processed with an aq. hydrophilic high polymer soln. In the formulas, R1 to R3 respectively denote 1 to 10C aliphat. hydrocarbon group, alicyclic hydrocarbon group, arom. hydrocarbon group or hydrogen atom. R4 denotes 1 to 10C bivalent aliphat. hydrocarbon group, alicyclic hydrocarbon group or arom. group. Z denotes the univalent or bivalent ion selected from hydrogen ion, NH4 ion and metal ions of group Ia, II, VIIa, VIII, IIb or IVb; (n) is 1 or 2. |
