| 摘要 |
PURPOSE:To improve the pattern profile, heat resistance and adhesiveness to a substrate by incorporating a specified polymer or its hydrogenation product and a compd. generation acid when irradiated with radiation, into the composition. CONSTITUTION:When the number of the repeating units of a polymer shown by formula I is denoted by (x) and the number of the repeating units shown by formula II by (y), the relation between (x) and (y) is 0.05etax/(x+y)<0.9. The composition contains the polymer or its hydrogenation product and a compd. generating acid by the irradiation with radioactive rays. In the formulas, R<1> is hydrogen atom or an alkyl, the four R<2>s can be the same different and are hydrogen atom, a halogen atom, hydroxyl, alkyl, alkenyl, etc. R<3>, R<4> and R<5> can be the same or different and are hydrogen atom, a halogen atom, etc., and at least one among the R<3>, R<4> and R<5> is an aryl. R<6> is hydrogen atom or an alkyl, and the four R<7>s can be the same or different and are the same substituent as mentioned in R<2>. |
