发明名称 METHOD AND APPARATUS FOR WATER TREATMENT
摘要 PURPOSE:To provide a simple water treatment method and its apparatus which easily produces drinking water, pure water, superpure water for the production of semiconductors, and plain water from sea water by cleaning water to be treated containing impurities by forming a cleaning treatment system with the use of ozone supply devices which can supply a large amount of highly concentrated ozone. CONSTITUTION:To a treatment system equipped with ozone supply devices 10, 11, 12, filtration devices 16, 17, and an ultraviolet irradiation device 18 is added a high purification process B including a precision filter 19 and an ion exchange resin 20. Clean water obtained by treating water to be treated 2 with the ozone supply devices, the filtration devices, and the ultraviolet irradiation device is further purified into superpure water in the high purification process B, and at the same time dissolved oxygen in water is decreased. In this way, superpure water and drinking water which can be used directly are discharged freely outside of the system from the final treatment process.
申请公布号 JPH05305298(A) 申请公布日期 1993.11.19
申请号 JP19920122944 申请日期 1992.04.17
申请人 DENPO FUMIO;MASUDA YOSHIHISA;SHIMAYA SHIROU 发明人 DENPO FUMIO
分类号 C02F1/20;A61L2/20;C02F1/32;C02F1/42;C02F1/44;C02F1/50;C02F1/78;C02F9/00 主分类号 C02F1/20
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