ETCHING METHOD FOR POLYSILICON FILM,申请号JP19920044247-传众专利搜索

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发明名称	ETCHING METHOD FOR POLYSILICON FILM
摘要
申请公布号	JPH05304119(A)	申请公布日期	1993.11.16
申请号	JP19920044247	申请日期	1992.03.02
申请人	NEC CORP	发明人	OIKAWA YOICHI
分类号	H01L21/302;H01L21/3065;H01L21/3213;(IPC1-7):H01L21/302	主分类号	H01L21/302
代理机构		代理人
主权项
地址

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