发明名称 |
Device for forming deposited film |
摘要 |
A device for forming a deposited film is provided. It comprises (a) a reaction chamber; (b) a heating means for heating a substrate placed in the reaction chamber; (c) a starting gas introducing means for introducing starting gases into the reaction chamber, the gas introducing means having a means for introducing two or more kinds of gases alternately and intermittently into the reaction chamber; (d) a decomposing means for decomposing the starting gases in the reaction chamber so as to form a deposited film on the substrate heated by said heating means in the reaction chamber, the decomposing means having a light source which irradiates at least one kind of light into the reaction chamber to decompose the starting gases.
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申请公布号 |
US5261961(A) |
申请公布日期 |
1993.11.16 |
申请号 |
US19920908891 |
申请日期 |
1992.07.08 |
申请人 |
CANON KABUSHIKI KAISHA |
发明人 |
TAKASU, KATSUJI;TSUDA, HISANORI;SANO, MASAFUMI;HIRAI, YUTAKA |
分类号 |
C23C16/48;C23C16/52;C23C16/54;(IPC1-7):C23C16/46;C23C16/50 |
主分类号 |
C23C16/48 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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