| 摘要 |
PCT No. PCT/SE90/00607 Sec. 371 Date Mar. 24, 1992 Sec. 102(e) Date Mar. 24, 1992 PCT Filed Sep. 24, 1990 PCT Pub. No. WO91/05030 PCT Pub. Date Apr. 18, 1991.This invention provides an apparatus for treatment or refinement of organic or inorganic material. The apparatus comprises a gas washing unit, a first chamber formed at the bottom of the gas washing unit, a second chamber formed at the top of the gas washing unit, and a plurality of vertical pipes provided to communicate the first and the second chambers. A first group of nozzles is provided near the top of the first chamber, so as to define a first washing step for gas entering the first chamber. Then the gas enters the lower ends of the pipes towards their upper ends. The second group of nozzles are provided over the upper ends of the pipes so that the sprayed washing water falls down through the pipes and collects the impurities contained in the gas to form a second washing step.
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