| 发明名称 |
Organometallic compounds |
| 摘要 |
The invention relates to organometallic compounds of the elements aluminum, gallium and indium which are two-fold intramolecularly stabilized, and to the use thereof for the production of thin films and epitaxial layers by deposition from the liquid or solid phase.
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| 申请公布号 |
US5259915(A) |
申请公布日期 |
1993.11.09 |
| 申请号 |
US19920856795 |
申请日期 |
1992.03.24 |
| 申请人 |
MERCK PATENT GMBH |
发明人 |
POHL, LUDWIG;SCHUMANN, HERBERT;WASSERMANN, WILFRIED;HARTMANN, UWE;SEUSS, THOMAS |
| 分类号 |
C07F5/00;C07F5/06;C07F9/50;C07F9/70;C07F9/90;C23C16/18;(IPC1-7):C36B19/00 |
主分类号 |
C07F5/00 |
| 代理机构 |
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