| 摘要 |
PURPOSE:To form a pattern having steps by exposing a pattern forming material which drastically changes dissolving rate at some developing time, through a mask having a pattern different in transmissivity. CONSTITUTION:The dissolving rate after exposing and baking the pattern forming material containing an alkali soluble phenolic resin, a dissolving restrainer, an acid precursor and an acid capturing agent, is drastically changed at some developing time. The pattern having steps is formed by baking and developing after exposing the material through the mask having the pattern different in transmissivity. Thus, the pattern having steps and high resolution is formed by the exposing method by the use of a short wavelength light exposure device. |
