| 摘要 |
PURPOSE:To improve the reproducibility of transfer and the mass-productivity by integrating a photomask for producing a microlens having a fine pattern or a product such as a diffraction grating by a pattern transfer with a spacer and a diffusion plate. CONSTITUTION:The photomask 10 is used or exposing a specified pattern 3 on a photosensitive resin film 4 arranged at the front surface side F by transmitting the light (a) from the rear surface side R to the front surface side F. The spacer 7 which controls the distance L from the photo sensitive resin film 4 and the diffusion plate 6 which scatters light are integrated with the photomask 10 so as not to be separated. Thus the deviation in a position of the spacer 7 and the diffusion plate 6 with respect to the photomask 10 does not generate at the irradiation job site and also the assembling of these three parts is unnecessitated, so that the reproducibility and mass-productivity are improved. |
