MICROWORKING METHOD USING PLASMA ETCHING,申请号JP19920062482-传众专利搜索

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发明名称	MICROWORKING METHOD USING PLASMA ETCHING
摘要
申请公布号	JPH05267242(A)	申请公布日期	1993.10.15
申请号	JP19920062482	申请日期	1992.03.18
申请人		发明人
分类号	G01N22/00;G01N24/14;G01R33/64;H01L21/302;H01L21/3065;H05H1/46;(IPC1-7):H01L21/302	主分类号	G01N22/00
代理机构		代理人
主权项
地址

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