CYCLIC CARBONATE COMPOUNDS, METHOD FOR PRODUCING THE SAME AND POSITIVE PHOTORESIST COMPOSITION USING THE SAME

摘要

This invention provides a process for producing a cyclic carbonate compound represented by the following formula (5): (5) or the like which is useful as a dissolution inhibitor for use in a chemically amplified positive photoresist, as well as a positive photoresist composition comprising said cyclic carbonate compound, an alkali-soluble resin and a photo-induced acid precursor. This composition gives a positive photoresist excellent in performances such as resolution, profile, sensitivity, etc.