| 摘要 |
PURPOSE:To provide an instrument for easily and accurately obtaining information about outermost atomic layers of a thin film. CONSTITUTION:A sample 8 set on a sample stage 7 in a superhigh-vacuum chamber 5 is irradiated with an electron beam 5 emitted from an electron gun 1 through a focusing lens 2, diaphragm 3, and objective lens 4. By detecting and analyzing the reflected secondary electrons from the irradiated part by means of a secondary electron detector 9 provided on the side wall of the chamber 6 at nearly the same level as that of the sample, the structure of the outermost surface of the sample 8, such as the distance between nearest atoms, etc., can be found. |
