发明名称 Process of developing a negative-working radiation-sensitive photoresist containing cyclized rubber polymer and contrast enhancing azo dye
摘要 A negative-working, radiation-sensitive composition comprising an admixture in a solvent of: (a) at least one cyclized rubber polymer, (b) at least one photoactive compound, and (c) an effective contrast enhancing amount of at least one rubber-soluble azo dye containing a reactive acrylate or methacrylate group of formula (I): <IMAGE> (I) wherein Q is a reactive group of the structure <IMAGE> wherein Y is either H or CH3; wherein R1 is either H, CH3, C2H5, CH2CH2CN, CH CH2OH or Q; wherein R2 is either H, CH3, OCH3, or NHCOCH3; wherein R3 is either H, OCH3 or OC2H5; and wherein X is selected from the group consisting of an unsubstituted or a substituted benzene, thiazole, thiophene, benzothiazole, benzoisothiazole, thiadiazole, and pyrazole moiety having, if substituted, 1-3 substituent groups selected from cyano, nitro, acetyl, and halogen groups; the amount of said cyclized rubber being about 90% to 99.5% by weight, the amount of said photoactive component being about 0.5% to about 10% by weight, based on the total solids content of said radiation-sensitive composition.
申请公布号 US5250392(A) 申请公布日期 1993.10.05
申请号 US19930009194 申请日期 1993.01.25
申请人 OCG MICROELECTRONIC MATERIALS, INC. 发明人 MARCOTTE, JR., STEPHEN F.;GRIFFITHS, JOHN
分类号 C09B29/08;C09B69/10;G03F7/027;G03F7/09;(IPC1-7):G03F7/30;G03C1/695;G03F7/012 主分类号 C09B29/08
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