PHOTOSENSITIVE RESIN COMPOSITION

摘要

PURPOSE:To obtain a photosensitive resin composition for short wave light source highly sensitively responding to short wave light source necessary to high precise working with a dimension of half micron or be less. CONSTITUTION:The photosensitive resin compound consists of poly (hydroxy styrene) allyl ether and an acid generating agent generating acid by the action of radioactive ray. As the acid generating agent, triallyl sulfonium salt or diallyl iodonium salt or aromatic sulfonate is used and the adding amount of the acid generating agent is 0.1-50wt.% to poly(hydroxy styrene) allyl ether.