| 摘要 |
PURPOSE:To provide a negative type photoresist compsn. fit for lithography with far UV and excellent in various properties such as resolution, sensitivity and heat resistance. CONSTITUTION:This negative type photoresist compsn. contains an alkali-soluble resin, a crosslinking agent and an acid generating agent. The alkali-soluble resin is obtd. by condensing aldehydes and phenols including a compd. represented by the general formula, wherein each of R1-R10 is H, halogen, alkyl or -OH, at least one of R1-R10 is -OH and at least two of o- and p-positions to the -OH is H. |
